发明申请
- 专利标题： TEMPLATE CLEANING METHOD, SYSTEM, AND APPARATUS
- 专利标题（中）： 模式清洗方法，系统和装置
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申请号： US12560210申请日： 2009-09-15
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公开(公告)号： US20100132742A1公开(公告)日： 2010-06-03
- 发明人: Hiroshi TOMITA , Hisashi OKUCHI , Minako INUKAI
- 申请人： Hiroshi TOMITA , Hisashi OKUCHI , Minako INUKAI
- 优先权： JP2008-307215 20081202
- 主分类号： B08B3/08
- IPC分类号： B08B3/08 ; B08B7/04 ; B08B13/00
摘要：
A template cleaning method for cleaning a template for nanoimprint, according to an embodiment of the present invention includes placing a wafer on a stage provided in a chamber, cleaning the wafer placed on the stage, inspecting the wafer for particles after the cleaning of the wafer, placing the template on the stage after the inspection of the wafer, and cleaning the template placed on the stage.
公开/授权文献
- US08375964B2 Template cleaning method, system, and apparatus 公开/授权日：2013-02-19
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