发明申请
- 专利标题: Semiconductor manufacturing apparatus and method
- 专利标题(中): 半导体制造装置及方法
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申请号: US12591592申请日: 2009-11-24
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公开(公告)号: US20100143081A1公开(公告)日: 2010-06-10
- 发明人: Hyeong-seob Oh , Yohan Ahn , Hyeong-Ki Kim , Ki-Doo Kim , Woo-Yong Lee , Min-Seon Lee
- 申请人: Hyeong-seob Oh , Yohan Ahn , Hyeong-Ki Kim , Ki-Doo Kim , Woo-Yong Lee , Min-Seon Lee
- 优先权: KR10-2008-0121013 20081202
- 主分类号: H01L21/677
- IPC分类号: H01L21/677 ; H01L21/673
摘要:
A semiconductor manufacturing apparatus includes a load port supporting a FOUP holding a plurality of wafers, a process module performing a semiconductor manufacturing process on the plurality of wafers, an equipment front end module disposed between the load port and the process module, providing a clean area, and including an opener for opening and closing a door of the FOUP, a transfer module sequentially transferring the plurality of wafers between the FOUP and the process module, and a purge module spraying a purge gas toward the plurality of wafers in the FOUP when the door is open to connect the equipment front end module and the FOUP, so as to make gases released from the plurality of wafers be recovered into the equipment front end module.
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