发明申请
- 专利标题： Rapid Patterning of Nanostructures
- 专利标题（中）： 纳米结构快速图案化
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申请号： US12692610申请日： 2010-01-23
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公开(公告)号： US20100144125A1公开(公告)日： 2010-06-10
- 发明人: Joseph M. Jacobson , Jae-bum Joo , Jon Varsanik , Vikrant Agnihotri
- 申请人： Joseph M. Jacobson , Jae-bum Joo , Jon Varsanik , Vikrant Agnihotri
- 申请人地址： US MA Cambridge
- 专利权人： MASSACHUSETTS INSTITUTE OF TECHNOLOGY
- 当前专利权人： MASSACHUSETTS INSTITUTE OF TECHNOLOGY
- 当前专利权人地址： US MA Cambridge
- 主分类号： H01L21/20
- IPC分类号： H01L21/20
摘要：
A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.
公开/授权文献
- US08367525B2 Rapid patterning of nanostructures 公开/授权日：2013-02-05
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