发明申请
- 专利标题： ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING , AND PATTERNING PROCESS
- 专利标题（中）： 抗反射涂层组合物，抗反射涂层和图案处理
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申请号： US12636546申请日： 2009-12-11
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公开(公告)号： US20100151381A1公开(公告)日： 2010-06-17
- 发明人: Seiichiro TACHIBANA , Kazumi Noda , Takeru Watanabe , Jun Hatakeyama , Takeshi Kinsho
- 申请人： Seiichiro TACHIBANA , Kazumi Noda , Takeru Watanabe , Jun Hatakeyama , Takeshi Kinsho
- 优先权： JP2008-316645 20081212
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; C08L31/02 ; G03F7/004
摘要：
A composition comprising (A) a fluorinated polymer having k=0.01-0.4 and n=1.4-2.1 and (B) an aromatic ring-bearing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure light in photolithography and has an acceptable dry etching rate.
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