发明申请
US20100151617A1 Method of growing silicon and method of manufacturing solar cell using the same
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生长硅的方法及使用其制造太阳能电池的方法
- 专利标题: Method of growing silicon and method of manufacturing solar cell using the same
- 专利标题(中): 生长硅的方法及使用其制造太阳能电池的方法
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申请号: US12461502申请日: 2009-08-13
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公开(公告)号: US20100151617A1公开(公告)日: 2010-06-17
- 发明人: Jung-hyun Lee , Chang-soo Lee , Dong-joon Ma
- 申请人: Jung-hyun Lee , Chang-soo Lee , Dong-joon Ma
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2008-0128184 20081216
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; C01B33/02
摘要:
In a method of growing silicon (Si) using a reactor, a supercritical fluid including a silicon Si source and hydrogen flows in the reactor, and the Si source reacts with hydrogen. A base substrate of a solar cell may be formed with Si made using the method of growing silicon (Si). The supercritical fluid may be a fluid in which Si is not oxidized and may be, for example, a CO2 supercritical fluid with a pressure of about 60 to about 200 atm. The Si source may be TriChloroSilane (TCS) (SiCl3H) or SiH4.
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