发明申请
US20100155222A1 APPLICATION OF DENSE PLASMAS GENERATED AT ATMOSPHERIC PRESSURE FOR TREATING GAS EFFLUENTS
审中-公开
在大气压力下生成的渗透等离子体在气体处理中的应用
- 专利标题: APPLICATION OF DENSE PLASMAS GENERATED AT ATMOSPHERIC PRESSURE FOR TREATING GAS EFFLUENTS
- 专利标题(中): 在大气压力下生成的渗透等离子体在气体处理中的应用
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申请号: US12719346申请日: 2010-03-08
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公开(公告)号: US20100155222A1公开(公告)日: 2010-06-24
- 发明人: Jean-Christophe ROSTAING , Daniel Guerin , Christian Larquet , Chun-Hao Ly , Michel Moisan , Hervé Dulphy
- 申请人: Jean-Christophe ROSTAING , Daniel Guerin , Christian Larquet , Chun-Hao Ly , Michel Moisan , Hervé Dulphy
- 申请人地址: FR Paris
- 专利权人: L'Air Liquide, Société Anonyme pour I'Exploitation des Procédés Georges Claude
- 当前专利权人: L'Air Liquide, Société Anonyme pour I'Exploitation des Procédés Georges Claude
- 当前专利权人地址: FR Paris
- 优先权: FR01/07150 20010531
- 主分类号: B01J19/08
- IPC分类号: B01J19/08
摘要:
The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) whereof the outlet is at a pressure substantially equal to atmospheric pressure, plasma generator (8), at the pump output, to produce a plasma at atmospheric pressure.