发明申请
- 专利标题: Metal-insulator-semiconductor tunneling contacts
- 专利标题(中): 金属绝缘体 - 半导体隧道触点
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申请号: US12317126申请日: 2008-12-19
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公开(公告)号: US20100155846A1公开(公告)日: 2010-06-24
- 发明人: Niloy Mukherjee , Gilbert Dewey , Matthew V. Metz , Jack Kavalieros , Robert S. Chau
- 申请人: Niloy Mukherjee , Gilbert Dewey , Matthew V. Metz , Jack Kavalieros , Robert S. Chau
- 主分类号: H01L29/78
- IPC分类号: H01L29/78 ; H01L21/04
摘要:
A contact to a source or drain region. The contact has a conductive material, but that conductive material is separated from the source or drain region by an insulator.
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