发明申请
- 专利标题: FORMING PHASE CHANGE MEMORIES WITH A BREAKDOWN LAYER SANDWICHED BY PHASE CHANGE MEMORY MATERIAL
- 专利标题(中): 通过相变记忆材料形成具有破损层的相变记忆
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申请号: US12346507申请日: 2008-12-30
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公开(公告)号: US20100163825A1公开(公告)日: 2010-07-01
- 发明人: Charles H. Dennison , George A. Gordon , John M. Peters
- 申请人: Charles H. Dennison , George A. Gordon , John M. Peters
- 申请人地址: IT Agrate Brianza
- 专利权人: STMICROELECTRONICS, S.r.l.
- 当前专利权人: STMICROELECTRONICS, S.r.l.
- 当前专利权人地址: IT Agrate Brianza
- 主分类号: H01L47/00
- IPC分类号: H01L47/00 ; H01L45/00
摘要:
A phase change memory cell may be formed with a pair of chalcogenide phase change layers that are separated by a breakdown layer. The breakdown layer may be broken down prior to use of the memory so that a conductive breakdown point is defined within the breakdown layer. In some cases, the breakdown point may be well isolated from the surrounding atmosphere, reducing heat losses and decreasing current consumption. In addition, in some cases, the breakdown point may be well isolated from overlying and underlying electrodes, reducing issues related to contamination. The breakdown point may be placed between a pair of chalcogenide layers with the electrodes outbound of the two chalcogenide layers.
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