发明申请
- 专利标题： REFERENCE WAFER FOR CALIBRATION AND METHOD FOR FABRICATING THE SAME
- 专利标题（中）： 用于校准的参考波形及其制造方法
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申请号： US12492888申请日： 2009-06-26
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公开(公告)号： US20100167064A1公开(公告)日： 2010-07-01
- 发明人: Hyun-Chul Lee , Jung-Taik Cheong , Gue-Hong Song , Ky-Hyun Han
- 申请人： Hyun-Chul Lee , Jung-Taik Cheong , Gue-Hong Song , Ky-Hyun Han
- 优先权： KR10-2008-0138575 20081231
- 主分类号： B32B9/04
- IPC分类号： B32B9/04 ; B44C1/22
摘要：
A reference wafer maintains laser accuracy and calibrates a camera and a laser of a semiconductor equipment. The reference wafer includes a first anti-reflection layer, an adhesive layer, a light absorption layer and a second anti-reflection layer that are stacked over a substrate, a light reflection layer formed over the second anti-reflection layer, and a protection layer formed over the light reflection layer.
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