Invention Application
US20100168323A1 PROPYLENE-BASED POLYMER AND METHOD FOR PRODUCING THE SAME, AND PROPYLENE-BASED RESIN COMPOSITION
有权
基于丙烯的聚合物及其制备方法和基于丙烯的树脂组合物
- Patent Title: PROPYLENE-BASED POLYMER AND METHOD FOR PRODUCING THE SAME, AND PROPYLENE-BASED RESIN COMPOSITION
- Patent Title (中): 基于丙烯的聚合物及其制备方法和基于丙烯的树脂组合物
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Application No.: US12514323Application Date: 2007-11-16
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Publication No.: US20100168323A1Publication Date: 2010-07-01
- Inventor: Masaaki ITO , Hideshi Uchino , Kazuya Sakata , Masaru Aoki , Masato Nakano , Shinichi Kitade
- Applicant: Masaaki ITO , Hideshi Uchino , Kazuya Sakata , Masaru Aoki , Masato Nakano , Shinichi Kitade
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: JAPAN POLYPROPYLENE CORPORATION
- Current Assignee: JAPAN POLYPROPYLENE CORPORATION
- Current Assignee Address: JP Minato-ku, Tokyo
- Priority: JP2006-311249 20061117
- International Application: PCT/JP2007/072317 WO 20071116
- Main IPC: C08L25/06
- IPC: C08L25/06 ; C08F210/06 ; C08F4/42 ; C08L23/04 ; C08L23/08

Abstract:
A propylene-based polymer comprising the following component (A) insoluble in p-xylene at 25° C. and component (B) soluble in p-xylene at 25° C., wherein (i) the weight average molecular weight (Mw) measured with GPC is 100,000 to 1,000,000, (ii) the content of the component insoluble in hot p-xylene is 0.3% by weight or lower, and (iii) the degree of strain hardening (λ max) in measurement of elongational viscosity is 2.0 or higher; and a method for producing the same, along with a resin composition comprising a propylene-ethylene copolymer (Z) in an amount of 50.0 to 99.9% by weight and a propylene-based polymer (M) in an amount of 0.1 to 50.0% by weight.Component (A): a component (CXIS) insoluble in p-xylene at 25° C., having requirements specified by (A1) to (A5). Component (B): a component (CXS) is soluble in p-xylene at 25° C., having requirements specified by (B1) to (B4).
Public/Granted literature
- US08324335B2 Propylene-based polymer and method for producing the same, and propylene-based resin composition Public/Granted day:2012-12-04
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