发明申请
US20100168404A1 Metal Complex Compositions and Methods for Making Metal-Containing Films
有权
金属复合物组合物和制备含金属膜的方法
- 专利标题： Metal Complex Compositions and Methods for Making Metal-Containing Films
- 专利标题（中）： 金属复合物组合物和制备含金属膜的方法
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申请号： US12595384申请日： 2008-04-09
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公开(公告)号： US20100168404A1公开(公告)日： 2010-07-01
- 发明人: Gregory S. Girolami , Do Young Kim , John R. Abelson , Navneet Kumar , Yu Yang , Scott Daly
- 申请人： Gregory S. Girolami , Do Young Kim , John R. Abelson , Navneet Kumar , Yu Yang , Scott Daly
- 申请人地址： US IL Urbana
- 专利权人： THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOI
- 当前专利权人： THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOI
- 当前专利权人地址： US IL Urbana
- 国际申请： PCT/US2008/059728 WO 20080409
- 主分类号： C07F5/02
- IPC分类号： C07F5/02 ; C07D307/04
摘要：
The present invention provides compositions of matter useful as deposition agents for making structures, including thin film structures and hard coatings, on substrates and features of substrates. In an embodiment, for example, the present invention provides metal complexes having one or more diboranamide or diboranaphosphide ligands that are useful as chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) precusors for making thin film structures and coatings. Metal complex CVD precursors are provided that possess volitilities sufficiently high so as to provide dense, smooth and homogenous thin films and coatings.
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