发明申请
- 专利标题: NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE
- 专利标题(中): 非挥发性半导体存储器件
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申请号: US12620986申请日: 2009-11-18
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公开(公告)号: US20100172189A1公开(公告)日: 2010-07-08
- 发明人: Kiyotaro Itagaki , Yoshihisa Iwata , Hiroyasu Tanaka , Masaru Kidoh , Masaru Kito , Ryota Katsumata , Hideaki Aochi , Akihiro Nitayama , Takashi Maeda , Tomoo Hishida
- 申请人: Kiyotaro Itagaki , Yoshihisa Iwata , Hiroyasu Tanaka , Masaru Kidoh , Masaru Kito , Ryota Katsumata , Hideaki Aochi , Akihiro Nitayama , Takashi Maeda , Tomoo Hishida
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-2376 20090108
- 主分类号: G11C16/04
- IPC分类号: G11C16/04 ; G11C7/06
摘要:
A non-volatile semiconductor storage device includes: a memory string including a plurality of memory cells connected in series; a first selection transistor having one end connected to one end of the memory string; a first wiring having one end connected to the other end of the first selection transistor; a second wiring connected to a gate of the first selection transistor. A control circuit is configured to boost voltages of the second wiring and the first wiring in the erase operation, while keeping the voltage of the first wiring greater than the voltage of the second wiring by a certain potential difference. The certain potential difference is a potential difference that causes a GIDL current.
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