发明申请
- 专利标题: METHOD AND APPARATUS FOR WRITING
- 专利标题(中): 书写方法与装置
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申请号: US12649846申请日: 2009-12-30
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公开(公告)号: US20100173235A1公开(公告)日: 2010-07-08
- 发明人: Yasuo KATO , Jun Yashima , Hiroshi Matsumoto , Tomoo Motosugi , Tomohiro Iijima , Takayuki Abe
- 申请人: Yasuo KATO , Jun Yashima , Hiroshi Matsumoto , Tomoo Motosugi , Tomohiro Iijima , Takayuki Abe
- 申请人地址: JP Numazu-shi
- 专利权人: NuFlare Technology, Inc.
- 当前专利权人: NuFlare Technology, Inc.
- 当前专利权人地址: JP Numazu-shi
- 优先权: JP2009-000729 20090106
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G21K5/00 ; G21K1/00
摘要:
A writing method includes calculating a proximity effect-corrected dose for correcting a proximity effect in charged particle beam writing, for each first mesh region made by virtually dividing a writing region of a target object into a plurality of first mesh regions of a first mesh size, calculating a fogging effect-corrected dose by using the proximity effect-corrected dose calculated and an area density in the first mesh size with respect to a part of a calculation region for calculating the fogging effect-corrected dose for correcting a fogging effect in the charged particle beam writing, and by using an area density in a second mesh size larger than the first mesh size with respect to a remaining part of the calculation region, synthesizing the fogging effect-corrected dose and the proximity effect-corrected dose for the each first mesh region, and writing a pattern on the target object by using a charged particle beam based on a synthesized correction dose.
公开/授权文献
- US08309283B2 Method and apparatus for writing 公开/授权日:2012-11-13