发明申请
- 专利标题: Methods of Setting Particulate Plugs in Horizontal Well Bores Using Low-Rate Slurries
- 专利标题(中): 使用低速浆料在水平井中设置颗粒塞的方法
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申请号: US12354551申请日: 2009-01-15
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公开(公告)号: US20100175878A1公开(公告)日: 2010-07-15
- 发明人: Keith A. Rispler , Loyd E. East , Ki Cherryl Whitt
- 申请人: Keith A. Rispler , Loyd E. East , Ki Cherryl Whitt
- 主分类号: E21B33/13
- IPC分类号: E21B33/13 ; E21B43/16 ; E21B43/267
摘要:
Methods for setting particulate plugs in at least partially horizontal sections of well bores are disclosed. In one embodiment, a method comprises the step of selecting a deposition location for a particulate plug within the at least partially horizontal section of the well bore. The method further comprises the step of providing a pumping conduit capable of delivering slurries to the deposition location. The method further comprises the step of pumping a first slurry through the pumping conduit to the deposition location such that a velocity of the first slurry in the well bore at the deposition location is less than or equal to the critical velocity of the first slurry in the well bore at the deposition location.