发明申请
- 专利标题: METHOD FOR CONTROLLING FLOW AND CONCENTRATION OF LIQUID PRECURSOR
- 专利标题(中): 用于控制液体前体流动和浓度的方法
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申请号: US12353076申请日: 2009-01-13
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公开(公告)号: US20100178423A1公开(公告)日: 2010-07-15
- 发明人: Akira Shimizu , Akiko Kobayashi , Hiroki Kanayama
- 申请人: Akira Shimizu , Akiko Kobayashi , Hiroki Kanayama
- 申请人地址: JP Tokyo
- 专利权人: ASM JAPAN K.K.
- 当前专利权人: ASM JAPAN K.K.
- 当前专利权人地址: JP Tokyo
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; F17D1/16
摘要:
A method for controlling flow and concentration of a liquid precursor includes: supplying a carrier gas to a first auto-pressure regulator and outputting therefrom the carrier gas at a first pressure to a precursor reservoir; outputting the mixture of the vaporized precursor and the carrier gas from the precursor reservoir; and supplying the mixture to a second auto-pressure regulator and outputting therefrom the mixture at a second pressure to a reactor via an orifice.
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