发明申请
US20100178528A1 TUNNEL MAGNETORESISTIVE THIN FILM AND MAGNETIC MULTILAYER FILM FORMATION APPARATUS 审中-公开
隧道磁阻薄膜和磁性多层膜成膜装置

  • 专利标题: TUNNEL MAGNETORESISTIVE THIN FILM AND MAGNETIC MULTILAYER FILM FORMATION APPARATUS
  • 专利标题(中): 隧道磁阻薄膜和磁性多层膜成膜装置
  • 申请号: US12602831
    申请日: 2008-06-06
  • 公开(公告)号: US20100178528A1
    公开(公告)日: 2010-07-15
  • 发明人: Koji TsunekawaYoshinori Nagamine
  • 申请人: Koji TsunekawaYoshinori Nagamine
  • 申请人地址: JP JP Kawasaki-shi
  • 专利权人: CANON ANELVA CORPORATION
  • 当前专利权人: CANON ANELVA CORPORATION
  • 当前专利权人地址: JP JP Kawasaki-shi
  • 优先权: JP2007-161325 20070619
  • 国际申请: PCT/JP2008/060418 WO 20080606
  • 主分类号: G11B5/39
  • IPC分类号: G11B5/39
TUNNEL MAGNETORESISTIVE THIN FILM AND MAGNETIC MULTILAYER FILM FORMATION APPARATUS
摘要:
A tunnel magnetoresistive thin film which can simultaneously realize a high MR ratio and low magnetostriction is provided.The tunnel magnetoresistive thin film comprises a magnetization fixed layer, a tunnel barrier layer, and a magnetization free layer, wherein the tunnel barrier layer is a magnesium oxide film containing magnesium oxide crystal grains and the magnetization free layer is a layered structure including a first magnetization free layer and a second magnetization free layer, the first magnetization free layer being made of alloy containing Co atoms, Fe atoms, and B atoms or containing Co atoms, Ni atoms, Fe atoms, and B atoms, having a body-centered cubic structure, and having (001) orientation, the second magnetization free layer being made of alloy containing Fe atoms and Ni atoms and having a face-centered cubic structure.
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