发明申请
US20100182578A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, SEAL STRUCTURE, METHOD OF REMOVING AN OBJECT AND A METHOD OF SEALING
有权
平版印刷设备，装置制造方法，密封结构，移除物体的方法和密封方法
- 专利标题： LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, SEAL STRUCTURE, METHOD OF REMOVING AN OBJECT AND A METHOD OF SEALING
- 专利标题（中）： 平版印刷设备，装置制造方法，密封结构，移除物体的方法和密封方法
-
申请号： US12697745申请日： 2010-02-01
-
公开(公告)号： US20100182578A1公开(公告)日： 2010-07-22
- 发明人: Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
- 申请人： Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/58
摘要：
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of a substrate table is arranged to be easily applied and removed and in an embodiment, reduces transmission of forces between the different parts.
公开/授权文献
信息查询
