发明申请
- 专利标题: LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
- 专利标题(中): 激光装置和极光超光源光源装置
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申请号: US12580523申请日: 2009-10-16
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公开(公告)号: US20100193710A1公开(公告)日: 2010-08-05
- 发明人: Osamu Wakabayashi , Akira Endo , Krzysztof Nowak , Takashi Suganuma , Masato Moriya
- 申请人: Osamu Wakabayashi , Akira Endo , Krzysztof Nowak , Takashi Suganuma , Masato Moriya
- 优先权: JP2008-267519 20081016; JP2008-334007 20081226; JP2009-211072 20090911
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; H01S3/10 ; H01S3/22 ; H01S3/0941
摘要:
An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.
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