发明申请
US20100193854A1 NON-VOLATILE MEMORY DEVICE USING HOT-CARRIER INJECTION 有权
使用热载体注射的非易失性存储器件

NON-VOLATILE MEMORY DEVICE USING HOT-CARRIER INJECTION
摘要:
Each of a hot-carrier non-volatile memory device and a method for fabricating the hot carrier non-volatile memory device is predicated upon a semiconductor structure and related method that includes a metal oxide semiconductor field effect transistor structure. The semiconductor structure and related method include at least one of: (1) a spacer that comprises a dielectric material having a dielectric constant greater than 7 (for enhanced hot carrier derived charge capture and retention); and (2) a drain region that comprises a semiconductor material that has a narrower bandgap than a bandgap of a semiconductor material from which is comprised a channel region (for enhanced impact ionization and charged carrier generation).
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