Invention Application
- Patent Title: LIQUID DISCHARGE APPARATUS
- Patent Title (中): 液体排放装置
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Application No.: US12693738Application Date: 2010-01-26
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Publication No.: US20100201738A1Publication Date: 2010-08-12
- Inventor: Shunji YAMAGUCHI , Shigeyoshi Hirashima
- Applicant: Shunji YAMAGUCHI , Shigeyoshi Hirashima
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2009-030534 20090212
- Main IPC: B41J2/165
- IPC: B41J2/165

Abstract:
A liquid discharge apparatus includes: nozzles discharging liquid; a liquid discharge head including nozzle arrays where the nozzles are arranged in one direction; a liquid adsorbent adsorbing liquid attached to a portion of the liquid discharge head where the nozzle arrays are formed; a moving means for relatively moving the liquid adsorbent in an arrangement direction of the nozzles; support rollers supporting the liquid adsorbent so as to allow the liquid adsorbent to rotate; a rotating shaft corresponding to the axis of rotation of the support roller and being rotated in a normal or reverse direction by using the relative movement of the liquid adsorbent, which is caused by the moving means, as a source of power; and a reverse rotation preventing means for transmitting the normal rotation of the rotating shaft to the support roller and not transmitting the reverse rotation of the rotating shaft to the support roller.
Public/Granted literature
- US08256873B2 Liquid discharge apparatus Public/Granted day:2012-09-04
Information query
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