- 专利标题: METHOD AND APPARATUS FOR CONTROLLING DIAMETER OF A SILICON CRYSTAL INGOT IN A GROWTH PROCESS
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申请号: US12719405申请日: 2010-03-08
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公开(公告)号: US20100206219A1公开(公告)日: 2010-08-19
- 发明人: Benno Orschel , Joel Kearns , Keiichi Takanashi , Volker Todt
- 申请人: Benno Orschel , Joel Kearns , Keiichi Takanashi , Volker Todt
- 专利权人: SUMCO PHOENIX CORPORATION
- 当前专利权人: SUMCO PHOENIX CORPORATION
- 主分类号: C30B15/24
- IPC分类号: C30B15/24
摘要:
An improvement to a method and an apparatus for growing a monocrystalline silicon ingot from silicon melt according to the CZ process. The improvement performs defining an error between a target taper of a meniscus and a measured taper, and translating the taper error into a feedback adjustment to a pull-speed of the silicon ingot. The conventional control model for controlling the CZ process relies on linear control (PID) controlling a non-linear system of quadratic relationship defined in the time domain between the diameter and the pull-speed. The present invention transforms the quadratic relationship in the time domain between the diameter and the pull-speed into a simile, linear relationship in the length domain between a meniscus taper of the ingot and the pull-speed. The present invention applies a linear control (modified PID) which operates in the length domain, and controls a system that has a linear relationship between the ingot taper and the pull-speed in the length domain to control the diameter of a growing silicon ingot.
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