Invention Application
US20100224850A1 Non-Volatile Memory Cells Employing a Transition Metal Oxide Layer as a Data Storage Material Layer and Methods of Manufacturing the Same 有权
使用过渡金属氧化物层作为数据存储材料层的非易失性存储单元及其制造方法

  • Patent Title: Non-Volatile Memory Cells Employing a Transition Metal Oxide Layer as a Data Storage Material Layer and Methods of Manufacturing the Same
  • Patent Title (中): 使用过渡金属氧化物层作为数据存储材料层的非易失性存储单元及其制造方法
  • Application No.: US12781907
    Application Date: 2010-05-18
  • Publication No.: US20100224850A1
    Publication Date: 2010-09-09
  • Inventor: In-Gyu BaekMoon-Sook Lee
  • Applicant: In-Gyu BaekMoon-Sook Lee
  • Priority: KR2004-72754 20040910
  • Main IPC: H01L45/00
  • IPC: H01L45/00 H01L27/105
Non-Volatile Memory Cells Employing a Transition Metal Oxide Layer as a Data Storage Material Layer and Methods of Manufacturing the Same
Abstract:
Non-volatile memory cells employing a transition metal oxide layer as a data storage material layer are provided. The non-volatile memory cells include a lower and upper electrodes overlapped with each other. A transition metal oxide layer pattern is provided between the lower and upper electrodes. The transition metal oxide layer pattern is represented by a chemical formula MxOy. In the chemical formula, the characters “M”, “O”, “x” and “y” indicate transition metal, oxygen, a transitional metal composition and an oxygen composition, respectively. The transition metal oxide layer pattern has excessive transition metal content in comparison to a stabilized transition metal oxide layer pattern. Methods of fabricating the non-volatile memory cells are also provided.
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