发明申请
- 专利标题: TRENCH ANTI-FUSE STRUCTURES FOR A PROGRAMMABLE INTEGRATED CIRCUIT
- 专利标题(中): 用于可编程集成电路的抗融合结构
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申请号: US12537473申请日: 2009-08-07
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公开(公告)号: US20100230781A1公开(公告)日: 2010-09-16
- 发明人: Roger A. Booth, JR. , Kangguo Cheng , Jack A. Mandelman , William R. Tonti
- 申请人: Roger A. Booth, JR. , Kangguo Cheng , Jack A. Mandelman , William R. Tonti
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L23/525
- IPC分类号: H01L23/525 ; H01L21/768
摘要:
Trench anti-fuse structures, design structures embodied in a machine readable medium for designing, manufacturing, or testing a programmable integrated circuit. The anti-fuse structure includes a trench having a plurality of sidewalls that extend into a substrate, a doped region in the semiconductor material of the substrate proximate to the sidewalls of the trench, a conductive plug in the trench, and a dielectric layer on the sidewalls of the trench. The dielectric layer is disposed between the conductive plug and the doped region. The dielectric layer is configured so that a programming voltage applied between the doped region and the conductive plug causes a breakdown of the dielectric layer within a region of the trench. The trench sidewalls are arranged with a cross-sectional geometrical shape that is independent of position between a bottom wall of the deep trench and a top surface of the substrate.