发明申请
US20100232209A1 CONTROL CIRCUIT FOR FORMING PROCESS ON NONVOLATILE VARIABLE RESISTIVE ELEMENT AND CONTROL METHOD FOR FORMING PROCESS 有权
用于形成非易失性电阻元件的控制电路和控制方法

  • 专利标题: CONTROL CIRCUIT FOR FORMING PROCESS ON NONVOLATILE VARIABLE RESISTIVE ELEMENT AND CONTROL METHOD FOR FORMING PROCESS
  • 专利标题(中): 用于形成非易失性电阻元件的控制电路和控制方法
  • 申请号: US12722851
    申请日: 2010-03-12
  • 公开(公告)号: US20100232209A1
    公开(公告)日: 2010-09-16
  • 发明人: Suguru KawabataKazuya IshiharaYoshiji Ohta
  • 申请人: Suguru KawabataKazuya IshiharaYoshiji Ohta
  • 优先权: JP2009-061771 20090313
  • 主分类号: G11C11/00
  • IPC分类号: G11C11/00
CONTROL CIRCUIT FOR FORMING PROCESS ON NONVOLATILE VARIABLE RESISTIVE ELEMENT AND CONTROL METHOD FOR FORMING PROCESS
摘要:
A nonvolatile semiconductor memory device can carry out a forming process simultaneously on the nonvolatile variable resistive elements of memory cells and make the forming time shorter. The nonvolatile semiconductor memory device has a forming detection circuit provided between the memory cell array and the second selection line (bit line) decoder. The forming detection circuit detects the completion of the forming process for memory cells by measuring the fluctuation in the potential of second selection lines or the current flowing through the second selection lines when applying a voltage pulse for a forming process through the second selection lines simultaneously to the memory cells on which a forming process is to be carried out connected to the same first selection line (word line), and prevents a voltage from being applied to the second selection lines connected to the memory cells where the completion of the forming process is detected.
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