发明申请
US20100233600A1 LEVEL SENSOR ARRANGEMENT FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
有权
液晶显示装置的水平传感器装置和装置的制造方法
- 专利标题： LEVEL SENSOR ARRANGEMENT FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 液晶显示装置的水平传感器装置和装置的制造方法
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申请号： US12722955申请日： 2010-03-12
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公开(公告)号： US20100233600A1公开(公告)日： 2010-09-16
- 发明人: Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
- 申请人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G01B11/14 ; G03B27/54
摘要：
A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
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