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21 条记录 (耗时 0.016 秒)

    LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD
    1.
    发明申请
    LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD 有权
    水平传感器，光刻设备和基板表面定位方法

    公开(公告)号：US20130077079A1

    公开(公告)日：2013-03-28

    申请号：US13603168

    申请日：2012-09-04

    申请人： Arie Jeffrey DEN BOEF ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    发明人： Arie Jeffrey DEN BOEF ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    IPC分类号： G03F9/00 ,  G01B11/06

    CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

    摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

    摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

    Using unflatness information of the substrate table or mask table for decreasing overlay
    7.
    发明申请
    Using unflatness information of the substrate table or mask table for decreasing overlay 有权
    使用衬底表或掩模台的不平坦信息减少重叠

    公开(公告)号：US20060114436A1

    公开(公告)日：2006-06-01

    申请号：US10998179

    申请日：2004-11-29

    申请人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

    发明人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70783 ,  G03F7/707

    摘要： The invention relates to a lithographic system that includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. The invention allows feed forward correction of non-flatness induced wafer grid distortion during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.

    摘要翻译： 本发明涉及一种光刻系统，其包括用于提供投影辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上具有图案的掩模，用于保持 基板和用于将图案化的光束投影到基板的目标部分上的投影系统。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 本发明允许在对准和曝光期间非平坦度引起的晶片格栅失真的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。

    Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier
    9.
    发明申请
    Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier 有权
    确定曝光设置的方法，平版曝光装置，计算机程序和数据载体

    公开(公告)号：US20090201473A1

    公开(公告)日：2009-08-13

    申请号：US12367191

    申请日：2009-02-06

    申请人： David Warren BURRY ,  Ralph BRINKHOF ,  Frank STAALS ,  Robert FRANKEN ,  Erik Johan KOOP

    发明人： David Warren BURRY ,  Ralph BRINKHOF ,  Frank STAALS ,  Robert FRANKEN ,  Erik Johan KOOP

    IPC分类号： G03B27/32 ,  G03B27/68 ,  G03B27/42

    CPC分类号： G03B27/32 ,  G03B27/68 ,  G03F7/70516

    摘要： Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.

    摘要翻译： 本发明的实施例涉及一种用于在光刻曝光过程中确定基板上的目标场的曝光设置的方法，包括通过在第二个多个校准位置确定校准场在第一方向上的位置来提供校准数据 和相对于校准场的位置的第三方向。 该方法还包括通过在第二和第三方向上建立目标场的衬底上的位置并且通过在相对于曝光位置的至少一个测量位置处测量第一方向上的曝光场的位置来提供生产数据 场在第二和第三个方向。