发明申请
- 专利标题: SUBSTRATE WITH METAL FILM AND METHOD FOR MANUFACTURING THE SAME
- 专利标题(中): 具有金属膜的基板及其制造方法
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申请号: US12732635申请日: 2010-03-26
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公开(公告)号: US20100243305A1公开(公告)日: 2010-09-30
- 发明人: Ayao NIKI , Atsushi Ishida , Ryojiro Tominaga
- 申请人: Ayao NIKI , Atsushi Ishida , Ryojiro Tominaga
- 申请人地址: JP Ogaki-shi
- 专利权人: IBIDEN CO., LTD
- 当前专利权人: IBIDEN CO., LTD
- 当前专利权人地址: JP Ogaki-shi
- 主分类号: H05K1/00
- IPC分类号: H05K1/00 ; C08F2/48 ; B05D3/06
摘要:
A method for manufacturing a substrate with a metal film includes preparing an insulative substrate having the first surface and the second surface on the opposite side of the first surface, forming in the insulative substrate a penetrating hole having the inner wall tapering from the first surface of the insulative substrate toward the second surface, forming a layer of a composition containing a polymerization initiator and a polymerizable compound on the inner wall of the penetrating hole, irradiating the layer of the composition with energy such that a polymer is formed on the inner wall of the penetrating hole, applying a plating catalyst on the polymer, and forming a plated-metal film on the inner wall of the penetrating hole.
公开/授权文献
- US08826530B2 Method for manufacturing substrate with metal film 公开/授权日:2014-09-09
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