发明申请
US20100243970A1 RESIN BLACK MATRIX, LIGHT BLOCKING PHOTOSENSITIVE RESIN COMPOSITION, TFT ELEMENT SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE
审中-公开
树脂黑色矩阵，光阻光敏树脂组合物，TFT元件基板和液晶显示装置
- 专利标题： RESIN BLACK MATRIX, LIGHT BLOCKING PHOTOSENSITIVE RESIN COMPOSITION, TFT ELEMENT SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE
- 专利标题（中）： 树脂黑色矩阵，光阻光敏树脂组合物，TFT元件基板和液晶显示装置
-
申请号： US12674170申请日： 2008-08-20
-
公开(公告)号： US20100243970A1公开(公告)日： 2010-09-30
- 发明人: Eriko Toshimitsu , Takao Hirota , Masami Kadowaki
- 申请人： Eriko Toshimitsu , Takao Hirota , Masami Kadowaki
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Chemical Corporation
- 当前专利权人： Mitsubishi Chemical Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-215973 20070822
- 国际申请： PCT/JP2008/064827 WO 20080820
- 主分类号： G02F1/361
- IPC分类号： G02F1/361
摘要：
Provided is a highly reliable resin black matrix, which has sufficient light-blocking characteristics, suppresses temperature increase due to heat generated by a TFT element and does not have failures of a TFT element substrate and fluctuation in liquid crystal drive. The maximum light transmittance of the resin black matrix in a wavelength range of 400 nm-700 nm is permitted to be 1% or less and the average light transmittance in a wavelength range of 850 nm-3,000 nm to be 60% or higher. Alternatively, the minimum light transmittance is permitted to be 50% or more.