发明申请
- 专利标题： MOUNTING TABLE STRUCTURE AND PLASMA FILM FORMING APPARATUS
- 专利标题（中）： 安装表结构和等离子体膜形成装置
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申请号： US12725902申请日： 2010-03-17
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公开(公告)号： US20100244350A1公开(公告)日： 2010-09-30
- 发明人: Toshiaki Fujisato , Ronald Nasman
- 申请人： Toshiaki Fujisato , Ronald Nasman
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-065236 20090317
- 主分类号： B23Q3/00
- IPC分类号： B23Q3/00
摘要：
A mounting table structure for mounting thereon an object to be processed to form a metal-containing thin film on the object includes a ceramic mounting table in which a chuck electrode and a heater are embedded, and a metal flange connected to a bottom surface of a peripheral portion of the mounting table. The mounting table structure further includes a metal base which is joined to the flange by screws and has a coolant path for flowing a coolant therein, and a metal seal member interposed between the flange and the base.
公开/授权文献
- US08592712B2 Mounting table structure and plasma film forming apparatus 公开/授权日：2013-11-26
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