发明申请
US20100245790A1 METHOD AND SYSTEM FOR DETECTING PARTICLE CONTAMINATION IN AN IMMERSION LITHOGRAPHY TOOL
有权
用于检测浸入式光刻工具中颗粒污染的方法和系统
- 专利标题: METHOD AND SYSTEM FOR DETECTING PARTICLE CONTAMINATION IN AN IMMERSION LITHOGRAPHY TOOL
- 专利标题(中): 用于检测浸入式光刻工具中颗粒污染的方法和系统
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申请号: US12732751申请日: 2010-03-26
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公开(公告)号: US20100245790A1公开(公告)日: 2010-09-30
- 发明人: Rolf Seltmann , Rene Wirtz
- 申请人: Rolf Seltmann , Rene Wirtz
- 优先权: DE102009015717.4 20090331
- 主分类号: G03B27/52
- IPC分类号: G03B27/52
摘要:
In an immersion lithography tool, the status of the immersion hood surface may be estimated on the basis of an inline detection system that generates optical measurement data. For example, a digital imaging system may be implemented in order to obtain optical measurement data without requiring exposure of the interior of the lithography tool to ambient air. In other cases, other optical measurement techniques, such as FTIR and the like, may be applied.
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