Invention Application
- Patent Title: Antireflective Coating Compositons
- Patent Title (中): 防反射涂料组合物
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Application No.: US12797949Application Date: 2010-06-10
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Publication No.: US20100248137A1Publication Date: 2010-09-30
- Inventor: David Abdallah , Francis Houlihan , Mark Neisser
- Applicant: David Abdallah , Francis Houlihan , Mark Neisser
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; C08L67/00 ; C08L63/00
![Antireflective Coating Compositons](/abs-image/US/2010/09/30/US20100248137A1/abs.jpg.150x150.jpg)
Abstract:
The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
Public/Granted literature
- US08211621B2 Antireflective coating compositions Public/Granted day:2012-07-03
Information query
IPC分类: