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发明申请
US20100248155A1 Illumination Control Module, and Diffraction Illumination System and Photolithography System Including the Same, and Methods of Fabricating Semiconductors Using the Same 审中-公开
照明控制模块和衍射照明系统及包括其的光刻系统以及使用其的半导体制造方法

Illumination Control Module, and Diffraction Illumination System and Photolithography System Including the Same, and Methods of Fabricating Semiconductors Using the Same
摘要：
An illumination control module, which enables one diffraction optical element (DOE) to be applied to various photolithography processes, and a diffraction illumination system and a photolithography system including the same are provided. The illumination control module includes a convex-ring-shaped upper lens, and a concave-ring-shaped lower lens.
摘要（中）：

提供一种照明控制模块，其能够将一个衍射光学元件（DOE）应用于各种光刻工艺，以及衍射照明系统和包括其的光刻系统。 照明控制模块包括凸环形上透镜和凹环形下透镜。

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