发明申请
- 专利标题: COPPER FILLING-UP METHOD
- 专利标题(中): 铜填充方法
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申请号: US12753530申请日: 2010-04-02
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公开(公告)号: US20100255269A1公开(公告)日: 2010-10-07
- 发明人: Naoki Okamoto , Kazuo Kondo , Hideyuki Kuri , Masaru Bunya , Minoru Takeuchi
- 申请人: Naoki Okamoto , Kazuo Kondo , Hideyuki Kuri , Masaru Bunya , Minoru Takeuchi
- 申请人地址: JP Osaka JP Fukushima
- 专利权人: Osaka Prefecture University Public Corporation,Nitto Boseki Co., Ltd.
- 当前专利权人: Osaka Prefecture University Public Corporation,Nitto Boseki Co., Ltd.
- 当前专利权人地址: JP Osaka JP Fukushima
- 优先权: JP2009-091012 20090403
- 主分类号: B05D5/12
- IPC分类号: B05D5/12 ; B05C3/02 ; C08K5/17 ; B32B3/10
摘要:
[Problem to be Solved] To provide a method of well filling copper in a non-through hole on a conductivity-rendered substrate by using a copper plating bath containing fewer additives.[Means for Solving the Problem] A method of filling copper in a non-through hole on a substrate that has been treated to render it conductive, which comprises plating said substrate in an acidic copper plating bath comprising a water-soluble copper salt, sulfuric acid and a filling additive that is a polymer having the activities of both of a brightener and a leveler.
公开/授权文献
- US08273232B2 Copper filling-up method 公开/授权日:2012-09-25
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