发明申请
- 专利标题： DUAL SIDED WORKPIECE HANDLING
- 专利标题（中）： 双面工作处理
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申请号： US12717647申请日： 2010-03-04
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公开(公告)号： US20100260943A1公开(公告)日： 2010-10-14
- 发明人: Richard J. HERTEL , Ernest E. Allen , Philip J. McGrail, JR.
- 申请人： Richard J. HERTEL , Ernest E. Allen , Philip J. McGrail, JR.
- 申请人地址： US MA Gloucester
- 专利权人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 当前专利权人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 当前专利权人地址： US MA Gloucester
- 主分类号： C23C14/48
- IPC分类号： C23C14/48
摘要：
A method includes positioning at least one dual sided workpiece on an assembly in a process chamber to expose a first side of the at least one dual sided workpiece, treating the first side of the at least one dual sided workpiece, reorienting a portion of the assembly in the process chamber to expose a second side of the at least one dual sided workpiece, the second side opposing the first side, and treating the second side. A processing apparatus including a process chamber defining an enclosed volume and a dual sided workpiece assembly disposed in the enclosed volume is also provided.
公开/授权文献
- US08563407B2 Dual sided workpiece handling 公开/授权日：2013-10-22