发明申请
- 专利标题： PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION
- 专利标题（中）： 微波投影曝光安装投影镜头系统
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申请号： US12825001申请日： 2010-06-28
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公开(公告)号： US20100265478A1公开(公告)日： 2010-10-21
- 发明人: Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Bärbel Schwaer , Olaf Rogalsky , Arif Kazi
- 申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Bärbel Schwaer , Olaf Rogalsky , Arif Kazi
- 申请人地址： DE Oberkochen
- 专利权人： CARL ZEISS SMT AG
- 当前专利权人： CARL ZEISS SMT AG
- 当前专利权人地址： DE Oberkochen
- 主分类号： G03B27/68
- IPC分类号： G03B27/68
摘要：
A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
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