发明申请
- 专利标题： LITHOGRAPHIC APPARATUS, METHOD FOR LEVELLING AN OBJECT, AND LITHOGRAPHIC PROJECTION METHOD
- 专利标题（中）： 平面设备，对象分级方法和平面投影方法
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申请号： US12809730申请日： 2008-12-22
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公开(公告)号： US20100265484A1公开(公告)日： 2010-10-21
- 发明人: Peter Gerhardus Wilhelmus Bussink , Anastasius Jacobus Anicetus Bruinsma , Hendricus Johannes Maria Meijer
- 申请人： Peter Gerhardus Wilhelmus Bussink , Anastasius Jacobus Anicetus Bruinsma , Hendricus Johannes Maria Meijer
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/NL08/50842 WO 20081222
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.
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