发明申请
- 专利标题： THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD
- 专利标题（中）： 薄膜成型装置和薄膜成型方法
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申请号： US12738951申请日： 2008-11-05
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公开(公告)号： US20100272887A1公开(公告)日： 2010-10-28
- 发明人: Kazuyoshi Honda , Yuma Kamiyama , Tomofumi Yanagi , Yasuharu Shinokawa , Masahiro Yamamoto
- 申请人： Kazuyoshi Honda , Yuma Kamiyama , Tomofumi Yanagi , Yasuharu Shinokawa , Masahiro Yamamoto
- 优先权： JP2007-288347 20071106; JP2007-324339 20071217
- 国际申请： PCT/JP2008/003185 WO 20081105
- 主分类号： B05D3/12
- IPC分类号： B05D3/12 ; C23C14/00 ; B05D3/00
摘要：
To provide a thin film forming apparatus capable of uniformly and adequately cooling down a substrate. The thin film forming apparatus of the present invention forms a thin film on an elongated substrate in vacuum and includes: a cooling body 1 provided close to a rear surface of the substrate being transferred at an opening 31; a gas introducing unit configured to introduce a gas to between the cooling body 1 and the substrate 21; and a substrate holding unit 3 configured to hold vicinities of both width-direction ends of the substrate traveling at the opening 31.
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