发明申请
- 专利标题： Alternating Self-Assembling Morphologies of Diblock Copolymers Controlled by Variations in Surfaces
- 专利标题（中）： 通过表面变化控制的双嵌段共聚物的交替自组装形态
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申请号： US12834097申请日： 2010-07-12
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公开(公告)号： US20100279062A1公开(公告)日： 2010-11-04
- 发明人: Dan B. Millward , Donald Westmoreland , Gurtej Sandhu
- 申请人： Dan B. Millward , Donald Westmoreland , Gurtej Sandhu
- 主分类号： B32B3/30
- IPC分类号： B32B3/30
摘要：
Methods for fabricating sublithographic, nanoscale microstructures arrays including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.
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