Invention Application
- Patent Title: Method for forming electrode pattern of ceramic substrate
- Patent Title (中): 形成陶瓷基板电极图案的方法
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Application No.: US12458834Application Date: 2009-07-23
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Publication No.: US20100301009A1Publication Date: 2010-12-02
- Inventor: Won Hee Yoo , Byeung Gyu Chang , Yong Suk Kim
- Applicant: Won Hee Yoo , Byeung Gyu Chang , Yong Suk Kim
- Applicant Address: KR Suwon
- Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Current Assignee Address: KR Suwon
- Priority: KR10-2009-0048593 20090602
- Main IPC: C23F1/00
- IPC: C23F1/00

Abstract:
The present invention relates to a method for forming electrode patterns of a ceramic substrate including the steps of: forming a plurality of conductive adhesion patterns on the ceramic substrate to be separated apart from one another; forming a plating seed layer, covering the conductive adhesion patterns, on the ceramic substrate; forming photoresist patterns, exposing parts corresponding to the conductive adhesion patterns, on the plating seed layer; forming a plating layer on the plating seed layer exposed by the photoresist patterns; removing the photoresist patterns; and etching parts of the plating seed layer exposed by removal of the photoresist patterns.
Public/Granted literature
- US08198198B2 Method for forming electrode pattern of ceramic substrate Public/Granted day:2012-06-12
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