发明申请
US20100302555A1 Metrology system and method for monitoring and correcting system generated errors
审中-公开
计量系统和方法,用于监控和校正系统产生的错误
- 专利标题: Metrology system and method for monitoring and correcting system generated errors
- 专利标题(中): 计量系统和方法,用于监控和校正系统产生的错误
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申请号: US12799362申请日: 2010-04-23
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公开(公告)号: US20100302555A1公开(公告)日: 2010-12-02
- 发明人: Hans-Artur Boesser , Slawomir Czerkas
- 申请人: Hans-Artur Boesser , Slawomir Czerkas
- 申请人地址: DE Weilburg
- 专利权人: KLA-Tencor MIE GmbH
- 当前专利权人: KLA-Tencor MIE GmbH
- 当前专利权人地址: DE Weilburg
- 优先权: DEDE102009025895.7 20090602
- 主分类号: G01B11/02
- IPC分类号: G01B11/02
摘要:
A metrology system (1) and a method for determining low order errors are disclosed. At least one measurement objective (9) for the determination of the position of structures (3) on a substrate (2) is provided. The substrate (2) to be measured rests in a support on three points of support (52). The support exhibits an opening (53) for measuring the substrate (2). At least two marks (54) are provided on the support for the mask (2) in such a way that the marks (54) are capturable with the measurement objective (9) by moving the measurement table (20). Furthermore the substrate (2) in the support does not screen the marks (54) on the support.
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