发明申请
US20100308333A1 THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL AND A METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL
有权
用于显示面板的薄膜晶体管阵列基板和用于制造用于显示面板的薄膜晶体管阵列基板的方法
- 专利标题: THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL AND A METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL
- 专利标题(中): 用于显示面板的薄膜晶体管阵列基板和用于制造用于显示面板的薄膜晶体管阵列基板的方法
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申请号: US12560652申请日: 2009-09-16
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公开(公告)号: US20100308333A1公开(公告)日: 2010-12-09
- 发明人: Hyeong-Suk YOO , Ho-Jun LEE , Sung-ryul KIM , O-Sung SEO , Hong-Kee CHIN
- 申请人: Hyeong-Suk YOO , Ho-Jun LEE , Sung-ryul KIM , O-Sung SEO , Hong-Kee CHIN
- 优先权: KR10-2009-0049090 20090603
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L21/336
摘要:
A method of manufacturing a thin film transistor capable of simplifying a substrate structure and a manufacturing process is disclosed. The method of manufacturing a thin film transistor array substrate comprising a three mask process. The 3 mask process comprising, forming a gate pattern on a substrate, forming a gate insulating film on the substrate, forming a source/drain pattern and a semiconductor pattern on the substrate, forming a first, second, and third passivation film successively on the substrate. Over the above multi-layers of the passivation film forming a first photoresist pattern comprising a first portion formed on part of the drain electrode and on the pixel region, and a second portion wherein, the second portion thicker than the first portion, and then patterning the third passivation film using the first photoresist pattern, forming a second photoresist pattern by removing the first portion of the first photoresist pattern, forming a transparent electrode film on the substrate, removing the second photoresist pattern and the transparent electrode film disposed on the second photoresist pattern; and forming a transparent electrode pattern on the second passivation layer.