发明申请
US20100316954A1 MONOMER HAVING LACTONE SKELETON, POLYMER COMPOUND AND PHOTORESIST COMPOSITION 审中-公开
具有肌肤的单体,聚合物和光电组合物

MONOMER HAVING LACTONE SKELETON, POLYMER COMPOUND AND PHOTORESIST COMPOSITION
摘要:
Disclosed is a novel monomer having a lactone skeleton, which is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or water solubility after hydrolysis.The monomer having a lactone skeleton is represented by following Formula (1),wherein Ra represents a hydrogen atom, halogen atom, or substituted or unsubstituted alkyl group having 1 to 6 carbon atoms; R1 represents a group having a lactone skeleton; and Y represents a bivalent organic group having 1 to 6 carbon atoms.
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