发明申请
- 专利标题: METHOD FOR PRODUCING A CELL CULTURE SUBSTRATE
- 专利标题(中): 生产细胞培养基质的方法
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申请号: US12881492申请日: 2010-09-14
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公开(公告)号: US20100330665A1公开(公告)日: 2010-12-30
- 发明人: Hideyuki Miyake , Hideshi Hattori , Yoichi Takahashi
- 申请人: Hideyuki Miyake , Hideshi Hattori , Yoichi Takahashi
- 申请人地址: JP Tokyo-to
- 专利权人: DAI NIPPON PRINTING CO., LTD.
- 当前专利权人: DAI NIPPON PRINTING CO., LTD.
- 当前专利权人地址: JP Tokyo-to
- 优先权: JP2004-042443 20040219
- 主分类号: C12M1/26
- IPC分类号: C12M1/26
摘要:
A main object of the invention is to provide a new method for producing a cell culture substrate used to cause cells to adhere in a highly precise form onto a base material and then culture the cells.To attain the object, the invention provides a method for producing a cell culture substrate comprising: a patterning substrate forming process of forming, on a base material, a cell culture patterning layer wherein a cell adhesion portion having cell adhesive properties and a cell adhesion-inhibiting portion having cell adhesion-inhibiting properties can be formed by action of a photocatalyst by energy irradiation, thereby forming a patterning substrate; an energy irradiating process of irradiating the energy onto the cell culture patterning layer, thereby forming the cell adhesion portion and the cell adhesion-inhibiting portion in a pattern form by action of the photocatalyst; and a cell-containing liquid applying process of applying a cell-containing liquid onto the cell adhesion portion by a region-selecting applying method of applying the cell-containing liquid selectively onto the patterned cell adhesion portion.
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