发明申请
US20110000509A1 PHOTORESIST TOOL CLEANING JIG CONFIGURED TO RECEIVE FLOW FROM TOP AND BOTTOM
审中-公开
摄影工具清洁配置配置从顶部和底部接收流量
- 专利标题: PHOTORESIST TOOL CLEANING JIG CONFIGURED TO RECEIVE FLOW FROM TOP AND BOTTOM
- 专利标题(中): 摄影工具清洁配置配置从顶部和底部接收流量
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申请号: US12259152申请日: 2008-10-27
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公开(公告)号: US20110000509A1公开(公告)日: 2011-01-06
- 发明人: Chin Yu Chen , Kin Mun Choong , Chun Chi Chen , Wei Zhu
- 申请人: Chin Yu Chen , Kin Mun Choong , Chun Chi Chen , Wei Zhu
- 申请人地址: CN Shanghai
- 专利权人: Semiconductor Manufacturing International (Shanghai Corporation)
- 当前专利权人: Semiconductor Manufacturing International (Shanghai Corporation)
- 当前专利权人地址: CN Shanghai
- 优先权: CN200810040279.1 20080704
- 主分类号: B08B9/093
- IPC分类号: B08B9/093
摘要:
A cup wash disk jig employed to clean photoresist from a spin-on chamber, receives cleaning solvent from both the bottom and the top, enhancing cleaning effectiveness. The cup wash disk includes a first set of channels allowing fluid communication between a hole positioned in a top surface of the cup wash disk jig, and a plurality of orifices distributed about the edge of the jig. Solvent is applied to the top surface of the jig, for example from an existing reduce resist control (RRC) nozzle normally utilized to dispense resist material. The solvent is flowed through these channels and ejected from the disk sides through the orifice, thereby facilitating removal of resist residue from coater cup portions of the chamber. Solvent may also be applied to an opening in a bottom surface of the jig, for example from a back rinse nozzle, to flow through a second set of channels and be ejected through different jig edge orifices.
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