发明申请
- 专利标题： POST SPUTTER WASH PROCESS MODULE
- 专利标题（中）： POST SPUTTER洗衣流程模块
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申请号： US12139383申请日： 2008-06-13
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公开(公告)号： US20110030733A1公开(公告)日： 2011-02-10
- 发明人: Dave Frost , Mike Rogowski , Yassin Mehmandoust , Tom Poplawski , Stan Young
- 申请人： Dave Frost , Mike Rogowski , Yassin Mehmandoust , Tom Poplawski , Stan Young
- 主分类号： B08B3/10
- IPC分类号： B08B3/10 ; B08B13/00
摘要：
In one embodiment, a method for cleaning a substrate in a cleaning module is disclosed. The method includes an operation that receives the substrate into a first level of the cleaning module. In another operation, the substrate is spun while contemporaneously applying a cleaning fluid to top and bottom surfaces of the substrate. In yet another operation, the substrate is spun at a second level of the cleaning module. The method also includes an operation to dry the substrate in an enclosed cavity at a third level of the cleaning module.