发明申请
- 专利标题: READ-ONLY MEMORY AND METHOD OF MANUFACTURE THEREOF
- 专利标题(中): 只读存储器及其制造方法
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申请号: US12536506申请日: 2009-08-06
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公开(公告)号: US20110031560A1公开(公告)日: 2011-02-10
- 发明人: Ching-Hsiang Hsu , Ching-Sung Yang , Shih-Jye Shen
- 申请人: Ching-Hsiang Hsu , Ching-Sung Yang , Shih-Jye Shen
- 主分类号: H01L27/112
- IPC分类号: H01L27/112 ; H01L21/336
摘要:
A mask-defined read-only memory array is formed on a substrate, and includes a first ROM bit and a second ROM bit of opposite polarities. The first ROM bit has a first MOS transistor and a first block layer formed over a first region of the substrate. A second source/drain region of the first MOS transistor and a first diffusion region are formed in a first region of the substrate on opposite sides of the first block layer. The second ROM bit includes a second MOS transistor.
公开/授权文献
- US08466519B2 Read-only memory device with contacts formed therein 公开/授权日:2013-06-18
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