发明申请
- 专利标题: PATTERNING PROCESS AND RESIST COMPOSITION
- 专利标题(中): 绘图工艺和耐腐蚀组合物
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申请号: US12849344申请日: 2010-08-03
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公开(公告)号: US20110033803A1公开(公告)日: 2011-02-10
- 发明人: Jun Hatakeyama , Kazuhiro Katayama , Youichi Ohsawa , Masaki Ohashi
- 申请人: Jun Hatakeyama , Kazuhiro Katayama , Youichi Ohsawa , Masaki Ohashi
- 申请人地址: JP Tokyo
- 专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-181504 20090804
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/20
摘要:
A pattern is formed by coating a first positive resist composition comprising a copolymer comprising lactone-containing recurring units, acid labile group-containing recurring units and carbamate-containing recurring units, and a photoacid generator onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for inactivation to acid, coating a second positive resist composition comprising a C3-C8 alcohol and an optional C6-C12 ether onto the first resist pattern-bearing substrate to form a second resist film, patternwise exposure, PEB, and development to form a second resist pattern.
公开/授权文献
- US08426115B2 Patterning process and resist composition 公开/授权日:2013-04-23