发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： LITHOGRAPHIC装置和装置制造方法
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申请号： US12913461申请日： 2010-10-27
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公开(公告)号： US20110037958A1公开(公告)日： 2011-02-17
- 发明人: Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- 申请人： Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
公开/授权文献
- US08514369B2 Lithographic apparatus and device manufacturing method 公开/授权日：2013-08-20
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