发明申请
US20110040068A1 Method for forming organic layer pattern, organic layer pattern prepared by the same and organic memory devices comprising the pattern
失效
用于形成有机层图案的方法,由相同的有机层图案和包含图案的有机存储器件
- 专利标题: Method for forming organic layer pattern, organic layer pattern prepared by the same and organic memory devices comprising the pattern
- 专利标题(中): 用于形成有机层图案的方法,由相同的有机层图案和包含图案的有机存储器件
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申请号: US12926024申请日: 2010-10-21
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公开(公告)号: US20110040068A1公开(公告)日: 2011-02-17
- 发明人: Sang Kyun Lee , Won Jae Joo , Kwang Hee Lee , Tae Lim Choi , Myung Sup Jung
- 申请人: Sang Kyun Lee , Won Jae Joo , Kwang Hee Lee , Tae Lim Choi , Myung Sup Jung
- 优先权: KR10-2006-0103429 20061024
- 主分类号: C08G73/10
- IPC分类号: C08G73/10
摘要:
Disclosed are a method for forming an organic layer pattern which is characterized by forming a thin layer by coating a coating solution including a polyimide-based polymer having a heteroaromatic pendant group including a heteroatom in its polyimide major chain, a photoinitiator and a crosslinking agent on a substrate and drying the substrate, and exposing and developing the thin layer, an organic layer pattern prepared by the method, and an organic memory device comprising the pattern. According to example embodiments, a high-resolution micropattern may be formed without undergoing any expensive process, e.g., photoresist, leading to simplification of the preparation process and cost reduction.