发明申请
US20110041337A1 METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD SUBSTRATE AND METHOD OF PROCESSING THE SUBSTRATE 有权
制造液体放电头基板的方法及其处理方法

  • 专利标题: METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD SUBSTRATE AND METHOD OF PROCESSING THE SUBSTRATE
  • 专利标题(中): 制造液体放电头基板的方法及其处理方法
  • 申请号: US12990093
    申请日: 2009-06-17
  • 公开(公告)号: US20110041337A1
    公开(公告)日: 2011-02-24
  • 发明人: Masataka KatoKeisuke Kishimoto
  • 申请人: Masataka KatoKeisuke Kishimoto
  • 申请人地址: JP Tokyo
  • 专利权人: CANON KABUSHIKI KAISHA
  • 当前专利权人: CANON KABUSHIKI KAISHA
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP2008-160306 20080619
  • 国际申请: PCT/JP2009/002758 WO 20090617
  • 主分类号: B23P17/04
  • IPC分类号: B23P17/04
METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD SUBSTRATE AND METHOD OF PROCESSING THE SUBSTRATE
摘要:
A method of processing a liquid discharge head substrate includes the step of providing the substrate, and the step of providing a recessed portion at a back surface of the substrate by discharging liquid in a linear form to the back surface of the substrate, and by processing the back surface of the substrate with laser light that has passed along the liquid and in the liquid.
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